Plasma Technology for Advanced Devices

Last update: June 8, 2008

 

05/30/08: IMFT launches 34 nm flash

 

04/08/08: Etch's Role in Novel Logic Device Patterning

 

02/22/08: The Cutting Edge of Plasma Etching

 

11/05/07: SAMSUNG's 64 Gbyte SSD

 

09/02/07: Etching of porous SiOCH

 

07/18/07: Carina High Temperature Etch for High k / Metal Gates

 

06/13/07: TI with high k at 45nm

 

06/12/07: Toshiba 3D SONOS

 

05/03/07: Self-assembled airgaps

 

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