![]() | ||||||||||||||||
Plasma Technology for Advanced Devices | ||||||||||||||||
Last update: June 8, 2008
05/30/08: IMFT launches 34 nm flash
04/08/08: Etch's Role in Novel Logic Device Patterning
02/22/08: The Cutting Edge of Plasma Etching
11/05/07: SAMSUNG's 64 Gbyte SSD
09/02/07: Etching of porous SiOCH
07/18/07: Carina High Temperature Etch for High k / Metal Gates
06/13/07: TI with high k at 45nm
06/12/07: Toshiba 3D SONOS
05/03/07: Self-assembled airgaps
| ||||||||||||||
![]() | ||||||||||||||
![]() | ||||||||||||||
![]() | ||||||||||||||
![]() | ||||||||||||||
![]() | ||||||||||||||
![]() | ||||||||||||||
Powered by | ||||||||||||||