| Event | Topics | Location | Date | Abstract Deadline | SPIE Advanced Lithography | Emerging Lithographic Technologies / Metrology, Inspection, and Process Control for Microlithography / Advances in Resist Materials and Processing Technology / Optical Microlithography / Design for Manufacturability | San Jose, California | 24-29 February 2008 |  | IEEE ISSCC 2008 | Analog and Digital Circuits, Displays, Static, Dynamic, Non-volatile, and Read-only Memory, Signal Processing, Wireless Communication, Molecular, Organic, and Nano-electronics | San Francisco, California | 8-12 February 2008 |  | 9th European AEC/APC | Integration of Metrology and Analytics into Production Tools, Data Management and Process Control, Sensors and Measurement Tools, Equipment / Process Fault Detection, Integrated Metrology | Tel-Aviv, Israel | 31 March - 2 April 2008 |  | 213th ECS Meeting | Fullerenes, Nanotubes, and Carbon Nanostructures, Plasma Processing, Thermal Processing of Si-based CMOS Devices, and other topics | Phoenix, Arizona | 18-22 May 2006 | 17 December 2007 | 2008 Symposia on VLSI Technology and Circuits | VLSI Devices and Processes, Quantum Effect Devices, New Materials, Advanced Lithography, Patterning Technologies, Process/Device Modeling, Digital, Analog,and Mixed Circuits, Memory Circuits | Honolulu, Hawaii | 17-20 June 2008 | 8 January 2008 | 22-st Symposium on Plasma Physics and Technology | Tokamaks, Short lived plasmas, Laser plasmas, Low temperature plasma, Plasma technology | Praha, Czech Republic | 16-19 June 2008 | 16 March 2008 | 35th IEEE Int. Conference on Plasma Science | Fully and Partially Ionized Plasmas, Microwave Generation and Plasma Interactions, Charged Particle Beams and Sources, High Energy Density Plasmas and Applications, Industrial, Commercial, and Medical Plasma Applications, Plasma Diagnostics, Pulsed Plasmas | Karlsruhe, Germany | 15-19 June 2008 | 15 February 2008 | IITC 2008 | Dielectrics, CMP/Planarization, Metallization, Process Integration, Process Control/Modelling, Reliability, Interconnect Systems, System-on-a-Chip, Dry Processing, Alternative Interconnect | San Francisco, California | 1-4 June 2008 | 1 January 2008 | 2008 Gordon Research Conference on Plasma Processing Science | Plasma in Biology and Medicine, Plasma in Hydrogen Production, Fuel Cells, Materials Treatment, Microplasmas, Atmospheric Pressure Plasma Chemistry, Plasma in Micro- and Nano- Technologies, Nano-Particles and Nano-Structure, Treatment of Materials | Mount Holyoke College South Hadley, MA | 13-18 July 2008 | 22 June 2008 | 61-st Gaseous Electronics Conference | Plasma and Nanotechnology, Biological and Emerging Applications, High Pressure Glow Discharges, Material Processing in Low Pressure Plasmas, Ionization, Dissociation, Slow Collisions, Lighting, Optical Diagnostics | University of Texas at Dallas | 13-17 October 2008 | 13 June 2008 | 214-th ECS Meeting | Nanotechnology, Thin Films, Materials, Processes, and Reliability, SiGe: Materials, Processing, and Devices, Electrochemistry of New Forms of Carbon, Nanostructure and Function of Fullerenes, Carbon Nanotubes, and Related Materials | Honolulu, Hawaii | 12-17 October 2008 | 30 May 2008 | AVS 55-rd International Symposium | AVS 55th International Symposium From Nano to Astronomical: The Science & Technology of Materials, Interfaces, & Processing | Boston, Massachusetts | 19-24 October 2006 | 14 May 2008 | 30th International Symposium on Dry Process (DPS 2008) | Plasma-, Photon-, Electron-, and Ion- Beam Induced Surface Reactions, Gas and Plasma Diagnostics, Process Technologies for Etching, CVD and Surface Treatment, MEMS, Nano Technologies and Bio-Applications, Equipment Technology for Dry Processes | Tokyo, Japan | 26-28 November 2008 |  | 2008 IEDM | Electron Devices: Strained Silicon Devices, Hf-based Gate Dielectrics, Modeling and Simulation, Quantum Electronics & Compound Semiconductors, Nanoscale Phenomena Based Memories, and other topics | San Francisco, California | 15-17 December 2006 | t.b.d. |
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