Plasma Technology for Advanced Devices

Last update: February 10, 2009

 

01/09/09: Advanced dRAMS's drive HAR Etch

 

12/08/08: High-k etch performance for next-generation logic gate stacks

 

12/02/08: High Aspect Ratio Dielectric Etch Advancement

 

05/30/08: IMFT launches 34 nm flash

 

04/08/08: Etch's Role in Novel Logic Device Patterning

 

02/22/08: The Cutting Edge of Plasma Etching

 

11/05/07: SAMSUNG's 64 Gbyte SSD

 

09/02/07: Etching of porous SiOCH

 

07/18/07: Carina High Temperature Etch for High k / Metal Gates

 

06/12/07: Toshiba 3D SONOS

 

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