Plasma Technology for Advanced Devices

Last update: January 10, 2010

 

01/10/10: 15-th International Congress on Plasma Physics

 

12/23/09: XX European Conference on the Atomic and Molecular Physics of Ionized Gases

 

12/20/09: Curing of 193 nm resists

 

12/18/09: 3-rd International Conference on Plasma Nanatechnology and Science

 

10/29/09: First announcement: 3-rd Workshop on Plasma Etch and Strip

 

01/09/09: Advanced dRAMS's drive HAR Etch

 

12/08/08: High-k etch performance for next-generation logic gate stacks

 

12/02/08: High Aspect Ratio Dielectric Etch Advancement

 

05/30/08: IMFT launches 34 nm flash

 

04/08/08: Etch's Role in Novel Logic Device Patterning

 

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